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Article Details

Journal Title
International Journal of Plasma Science and Engineering
Volume
2009
Article Title
Plasma-Induced Damage on the Reliability of Hf-Based High-k/Dual Metal-Gates Complementary Metal Oxide Semiconductor Technology
List of Authors
  • Yao-Jen Lee
  • Horng-Chih Lin
  • Tiao-Yuan Huang
Article ID
308949
Article Type
Research Article
No. of Pages
10 Pages
Corresponding Author
Wu-Te Weng
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Invoice Details

Invoice Issue Date
7 October 2022
Type of Reprints
Colored, Covered
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