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Article Details
- Journal Title
- International Journal of Plasma Science and Engineering
- Volume
- 2008
- Article Title
- Etch Defect Characterization and Reduction in Hard-Mask-Based Al Interconnect Etching
- List of Authors
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- Che-Lun Hung(ORCID ID: http://orcid.org/0000-0002-8906-9367)
- Chia-Hao Leng
- Nan-Tzu Lian
- Ling-Wu Young
- Tahone Yang
- Kuang-Chao Chen
- Chih-Yuan Lu
- Article ID
- 154035
- Article Type
- Research Article
- No. of Pages
- 5 Pages
- Corresponding Author
- Hong-Ji Lee
- Additional Authors
Invoice Details
- Invoice Issue Date
- 5 May 2024
- Type of Reprints
- Colored, Covered
- Invoice Ref. No.
- Terms
- Payable upon Receipt
Charges
- No. of Copies
- Reprints Charges
- 0.00
- Total
- $